Surface & Interface Scientist in Layer Development and Analysis (m/f/x)

Carl Zeiss Jena GmbH

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Oberkochen Until 9/27/2026 H-1B sponsor history First posted July 29, 2026 Last posted July 29, 2026
Job description

ZEISS Semiconductor Manufacturing Technology

 

Enabler for smaller, more powerful, and more energy-efficient microchips

 

Working for tomorrow today.

Around 80 percent of all microchips worldwide are produced using ZEISS technologies. As the centerpiece of every electronically controlled system, they have become an integral part of our everyday lives – whether in smartphones, smart homes or smart factories. ZEISS is a technology leader in the field of semiconductor manufacturing equipment. With high-precision lithography optics, photomask systems and process control solutions, ZEISS enables the production of ever smaller, increasingly powerful, and more energy-efficient microchips, and thus plays a pivotal role in the age of micro- and nanoelectronics.


Your Role:

  • Together with an interdisciplinary team of experts, you will help shape the further development of thin films to meet future requirements
  • To do this, you will draw on your diverse knowledge of analytics and use experimental methods to shed light on the complex relationships between film design, manufacturing processes, and cleanliness as they affect film lifespan
  • You will creatively identify potential damage mechanisms in thin films and at interfaces
  • Your network of internal and external partners will help you find and apply the right analysis for each problem and piece your results together like puzzle pieces to form a complete picture
  • You will become a competent point of contact for project management and manufacturing regarding lifespan issues and tolerances

Your Profile:

  • A completed degree in the natural sciences or engineering (Master’s/Diploma), e.g., physics, chemistry, physical or inorganic chemistry, materials science, crystallography, mineralogy, and nanotechnology
  • Several years of experience in layer, defect, or cleanliness analysis, e.g., light microscopy, UV-Vis/IR/fluorescence/PAS spectroscopy, TEM, TOF-SIMS, XRD, XPS, RBS/ERDA, etc.
  • Knowledge of additional analytical methods, e.g., AFM, S-TEM, STM, as well as expertise in the fields of solid-state physics at interfaces, reaction kinetics, radiation damage, and coating technology is a plus
  • Ideally, experience in the areas of machine learning, large language models, and data science
  • Team spirit, creativity, curiosity, and a passion for working independently and taking initiative
  • Strong communication skills, a structured work style, and the ability to thrive under pressure in a dynamic environment
  • Business-level proficiency in German and English

Your ZEISS Recruiting Team:

Oliver Reith
About this role

Summary

Develop and analyze thin films, interfaces, and damage mechanisms for microchips.

Job title

Surface & Interface Scientist in Layer Development and Analysis (m/f/x)

Experience level

several years

Industry

semiconductor

Location requirements

Oberkochen, on-site, no remote work permitted.

Salary

Not specified

Visa sponsorship

H-1B sponsor history

Management role

No

Skills & keywords

Required skills

layer analysisUV-VisIRfluorescencePAS spectroscopyTEMTOF-SIMSXRDXPSRBSERDA

Preferred skills

AFMS-TEMSTMsolid-state physicsreaction kineticsradiation damagecoating technologymachine learningdata science

Specializations

layer analysisthin filmsinterfacemicroelectronics
Locations

Structured locations inferred from the posting.

73447 Oberkochen, Germany

On-site City